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The Alba Synchrotron and the UB are looking for candidates for an Industrial Doctorate project

 

ORIGINAL NEWS – www.sincrotronalba.es11/11/2018

El Sincrotró ALBA juntament amb la Universitat de Barcelona (UB) ha presentat una proposta al Pla de Doctorats Industrials de la Generalitat de Catalunya per contractar un estudiant investigador que es dedicarà a un projecte industrial mentre realitza estudis de doctorat.

The industrial project will focus on low pressure RF plasma technology, as well as the deposition of the atomic layer (ALD) and consists of an applied part and a scientific part. The first part applied is oriented to the additional technical development of an RF plasma source for the cleaning of optical precision surfaces and critical UHV cameras, especially for large optical components, in the field of synchrotron optics and free electron lasers (FEL) such as next generation extreme semiconductor ultraviolet lithography (EUV). The last scientific part deals with R&D activities focused on the use of the same type of RF plasma source for the epitaxial thin film deposition of hybrid multilayers of graphene / metallic oxide, using internal competences on the deposition of the atomic layer (ALD) as an additional tool for the deposition of thin films of metallic oxide on graphene carbon nanostructures aimed at supercapaciting materials.

The doctoral student will be hired by ALBA, where most of the work will be carried out.

To submit an application for an industrial doctorate project, a digital copy of the completed form must be sent to doctorats.industrials.sur@gencat.cat, and the original signed to the Agency for Management of University and Research Grants (AGAUR): Passeig Lluís Companys, 23, 08010 Barcelona (RE: Industrial Doctorate Project).

Remember that the request must be sent to the Catalan administration as indicated in the instructions and not to CELLS-ALBA.

For more information visit the following website or contact industrialoffice@cells.es